| Title | A novel approach to coat silica on quantum dots: Forcing decomposition of tetraethyl orthosilicate in toluene at high temperature |
| Authors | 黄新堂 |
| Issue Date | 2020 |
| Publisher | Journal of Alloys & Compounds |
| Keywords | Core/shell quantum dots SiO2 Stability TEOS Water solubility |
| Abstract | The coating of silica (SiO 2) on quantum dots (QDs) has been widely studied, because SiO 2 can protect QDs from the damages of moisture, radiation, and heat. Conventional SiO 2 coating methods for QDs are usually performed in aqueous or emulsion solutions, which require the addition of water for the hydrolysis of SiO 2 precursors and lead to the photoluminescence (PL) quenching of QDs. To address this issue, a novel SiO 2 coating approach on single particle level was developed by the thermally forcing decomposition of tetraethyl orthosilicate in toluene. The CdSe/CdS/ZnS:Al@SiO 2 nanoparticles (NPs) were prepared without decreasing the original PL quantum yield (QY), which exhibited much better photo and thermal stability in comparison with uncoated CdSe/CdS/ZnS:Al QDs. Furthermore, due to the natural formation of silanol groups on the SiO 2 shell, CdSe/CdS/ZnS:Al@SiO 2 NPs present not only good solubility but also excellent room temperature stability in phosphate buffer saline solution for several months. Image 1 • A novel silica coating approach on single particle level for QDs was developed. • The resulted silica coated samples exhibit good photo and thermal stability in comparison with uncoated QDs. • The resulted samples present not only good solubility but also excellent room temperature stability in PBS solution. |
| Appears in Collections: | 基科部办公室 |
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